In a partnership with Semiconductor Technology Academic Research Center (STARC) — Japan's leading semiconductor technology research organization — Clear Shape Technologies plans to jointly develop, validate and deploy a variability-aware design-for-manufacturing (DFM) flow. The flow includes Clear Shape's InShape tool for systematic variability analysis that enables optimization during implementation using commercial routing tools.
A number of issues have come to light within the area of ultra-miniature technologies under 65 nm, including the design dependency of processing accuracy in semiconductor construction and production fluctuations. For this reason, DFM has become extremely important. STARC develops and promotes the practical application of DFM technologies with the aim of achieving 45-nm and 32-nm SoCs. This requires unprecedented cross-functional cooperation between various companies and disciplines, something STARC is well positioned for. A complete plan to address variability that includes practical design considerations has been developed by working closely with the member companies.
For more information, check out Clear Shape Technologies and Semiconductor Technology Academic Research Center (STARC).