In an effort to reduce energy loss and save chip space, Intel has created a 45-nm processor using a Hafnium-based high-k metal gate (Hi-k) formula for the hundreds of millions of transistors inside these processors. This achievement is the biggest advancement in the transistor industry in 40 years, according to Intel Co-Founder Gordon Moore.
Intel’s Hi-K method excludes the use of lead in manufacturing chips, reducing the reliance on harmful elements to the environment. The company also hopes to eliminate halogens from the manufacture process in 2008. And its 45-nm process reduces product size by 25% and touts more than twice the transistor density of previous 65-nm chips.
Over 820 million transistors are used in the new processors. Previous technology used around 582 million transistors on the same chips built using the current standard technology.
"The intellects, physics and designs that went into solving one of the industry's most daunting challenges are awe-inspiring and I congratulate the Intel teams for this breakthrough achievement," said Paul Otellini, Intel president and CEO. "Best yet, this feat, coupled with our industry-leading architectures, means faster and sleeker computers, longer battery life and better energy efficiency. Our objective is to bring consumers a new class of computers delivering a full Internet experience in ever-smaller, more portable form factors."
Intel will use the 45-nm processors in its dual- and quad-core Xeon processors. Intel looks to move into mobile SoC and consumer electronic markets with this new technology next year.
-Extend_battery_and_shelf_life_without_compromising_system_performance.png?auto=format,compress&fit=crop&h=139&w=250&q=45)