Formal Verification Tools Check SoCs Down To Transistor Level

June 10, 2002
Targeted for users of next-generation physical design closure tools, customer-owned tooling (COT) flows, and advanced ASIC flows, a new suite of formal verification products reaches into the physical domain for system-on-a-chip (SoC) applications....

Targeted for users of next-generation physical design closure tools, customer-owned tooling (COT) flows, and advanced ASIC flows, a new suite of formal verification products reaches into the physical domain for system-on-a-chip (SoC) applications. The Conformal Logic Equivalence Checker (LEC) and Transformal Logic Transistor eXtractor (LTX) perform advanced verification on all logic blocks of complex SoCs, from register-transfer level (RTL) to final layout-versus-schematic netlist comparisons. Together, the tools make up a flow Verplex terms Conformal Layout Versus RTL (LVR). Blocks checked include memory, compiled datapath, memory control, intellectual property cores, complex I/O, and full-custom logic. Traditionally, formal verification tools have not reached the transistor level, missing mistakes made in the layout process and other back-end steps. Shipping now, the tools support 64-bit HP, Sun, and Linux platforms. Conformal LEC is priced from $105,000; Transformal LTX from $95,000; and Conformal LVR (available in the third quarter) from $105,000.

Verplex Systems Inc.
www.verplex.com; (408) 536-0300

About the Author

David Maliniak | MWRF Executive Editor

In his long career in the B2B electronics-industry media, David Maliniak has held editorial roles as both generalist and specialist. As Components Editor and, later, as Editor in Chief of EE Product News, David gained breadth of experience in covering the industry at large. In serving as EDA/Test and Measurement Technology Editor at Electronic Design, he developed deep insight into those complex areas of technology. Most recently, David worked in technical marketing communications at Teledyne LeCroy. David earned a B.A. in journalism at New York University.

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