Electronic Design

Place-And-Route Tool Improves Runtimes And Capacity

In the 2007.03 release of IC Compiler, Synopsys' flagship place-and-route tool, designers can look for faster runtimes, higher capacity, smarter multicorner/multimode (MCMM) optimizations, and improved predictability compared to earlier versions. The release also rolls out physical design support for the emerging 45-nm technology node.

According to Synopsys, IC Compiler 2007.03 can deliver a 35% runtime improvement over previous editions without trading off quality of results in its fastest operating mode. Coupled with improved capacity approaching 10 million gates on 16-Gbyte platforms, it lets users take on larger block partitions.

The release adds early access to integrated hierarchical design planning, enabling users to efficiently tackle designs in the 100 million-gate range. Its physical feasibility flow enhances productivity by letting users quickly generate and analyze multiple trial floorplans to determine the best starting point for detailed implementation.

For advanced designs, IC Compiler 2007.03 introduces Adaptive MCMM optimization technology, which delivers faster runtime and smaller memory utilization while providing the same level of accuracy. IC Compiler's approach to implementing truly concurrent optimization for designs with multiple modes and corners brings advantages to advanced users.

These users can't afford the scheduling impact of sequential optimization or accept less accurate merging techniques, like those in other place-and-route tools. The advanced designs also benefit from IC Compiler's signoff-driven timing closure, which is now available as a production capability.

For emerging 45-nm designs, IC Compiler now includes 45-nm placement and routing design rules. It also meets the new requirements for lithography compliance and CMP-related (chemical-mechanical polishing) metal uniformity.

IC Compiler 2007.03 is available immediately. Contact Synopsys directly for pricing information.

Synopsys
www.synopsys.com

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