Revised VRM Specification Accompanies Migration to 45-nm Processors

Intel's recently announced move from 65-nm to 45-nm process technology in the next generation of Intel Core2 processors is having a big impact on fundamental
March 1, 2007

Intel's recently announced move from 65-nm to 45-nm process technology in the next generation of Intel Core2 processors is having a big impact on fundamental transistor design for CPUs. But based on information provided by industry sources, the impact of the new 45-nm technology on the CPU power-supply design may be relatively minor.

According to industry sources, power requirements for the 45-nm processors, which are spelled out in Intel's VRM 11.1 specification, are similar to those specified in VRM 11.0, the Intel specification governing the power to CPUs built in 65-nm processes.

As one source summarized the changes, VRM 11.1 is essentially the same as VRM 11.0 except with provisions for light-load efficiency. The microprocessor sends a signal to the VRM when it's about to enter a light load operation. VRM developers can use that signal to optimize VRM efficiency.

By using a new material combination of high-k gate dielectrics and metal gates, Intel's 45-nm transistors significantly improve performance to deliver faster multi-core processors that consume less power. The first working 45-nm processors are already running multiple operating systems and various applications. Intel is on track for 45-nm production in the second half of 2007.

Sign up for our eNewsletters
Get the latest news and updates

Voice Your Opinion!

To join the conversation, and become an exclusive member of Electronic Design, create an account today!