Thermo Fisher Scientific released the nProber IV nanoprober platform, a fault isolation system for semiconductor fabs to precisely locate and characterize nanometer-scale electrical faults impacting device performance and reliability. Presented as the company’s easiest-to-use SEM-based nanoprobing solution to date, the system extends nanoprobing to more users while giving them the data required for a fast and efficient fault-analysis process.
Failure analysis lab managers who need to improve the efficiency of their TEM workflows can take advantage of the automation and guided operation built into the nProber IV. It enables production-oriented precise fault localization at the leading edge while reducing the need for expert users.
The nProber IV provides specific localization and accurate electrical characterization of parametric faults in advanced FinFET transistors by combining an ultra-stable, temperature control probing platform and low energy electrostatic nanoprobing LEEN2 SEM column that enables probing at 100eV to support today's advanced technologies. Transistor characterization at less than 1 nanosecond pulsing improves the detection of resistive gate faults.
The nProber IV introduces the second-generation EBIRCH2 detection system, for enhanced sensitivity and the precise localization of low impedance faults. EBIRCH2 fault localization is combined with the LEEN2 SEM column that can operate at up to 100nA, allowing the nProber IV system to localize faults in 3D NAND and interconnect structures.
In addition, nProber IV efficiency is enhanced with the easyProbe automation system, which automates much of the nanoprobing workflow. This allows for extended periods of unattended operation, allowing users to spend time on other tasks in the FA lab while the nProber IV system operates.
