Tool Sorts Out The Relationship Between SoC Leakage Current And Temperature

Aug. 17, 2006
For designs at 90 nm and below, leakage-current management has become a key design challenge. To accurately analyze chip leakage, designers must consider the temperature variation of the chip based on transistor switching current. Apache's Sahara-PTE

For designs at 90 nm and below, leakage-current management has become a key design challenge. To accurately analyze chip leakage, designers must consider the temperature variation of the chip based on transistor switching current.

Apache's Sahara-PTE offers an integrated means of analyzing the impact of a system-on-a-chip (SoC) design's temperature on leakage, timing, reliability, and voltage drop. Based on 3D thermal models and on the simulation kernel from Apache's RedHawk, Sahara-PTE takes in location-based boundary temperature conditions or extracted package thermal models for fast and accurate power-thermal convergence.

Chip temperature affects the metal resistivity, interconnect self-heating, and voltage drop across the design. Sahara-PTE analyzes the impact on resistance extraction, wire electromigration, and voltage drop. By considering the temperature variation across the chip instead of using constant corner values, Sahara-PTE also provides a much more accurate full-chip analysis of critical paths and clock timing for silicon signoff.

Sahara-PTE will be available this quarter for production use. Annual license pricing starts at $160,000.

Apache Design Solutions
www.apache-da.com

About the Author

David Maliniak | MWRF Executive Editor

In his long career in the B2B electronics-industry media, David Maliniak has held editorial roles as both generalist and specialist. As Components Editor and, later, as Editor in Chief of EE Product News, David gained breadth of experience in covering the industry at large. In serving as EDA/Test and Measurement Technology Editor at Electronic Design, he developed deep insight into those complex areas of technology. Most recently, David worked in technical marketing communications at Teledyne LeCroy. David earned a B.A. in journalism at New York University.

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