Open Verification Methodology Sprouts Hierarchical Guidelines

Sept. 16, 2008
The latest version of the Open Verification Methodology (OVM) provides a new OVM User Guide, which contains step-by-step guidelines to help users develop reusable, interoperable verification IP and hierarchical environments to facilitate plug-and-play ver

The latest version of the Open Verification Methodology (OVM) provides a new OVM User Guide, which contains step-by-step guidelines to help users develop reusable, interoperable verification IP and hierarchical environments to facilitate plug-and-play verification. Spearheaded by Mentor Graphics Corp. and Cadence Design Systems, the open-source OVM 2.0 extends the sequential stimulus mechanism in the OVM with transaction-level modeling (TLM) interfaces to improve the modularity and reuse of stimulus sequences. Other enhancements include direct support for parameterized classes in the OVM factory and built-in debug support for TLM connections throughout the hierarchy.

The OVM User Guide provides straightforward documentation on all aspects of the OVM, including an extensive review of TLM for verification, guidelines for developing reusable OVM verification components, instructions for building verification tests, and in-depth discussions on the more advanced features of the OVM. The guide also includes an extensive example showing how to apply these concepts to the creation of a full hierarchical verification environment, including tests that configure the environment and select the desired stimulus sequences to exercise the required functionality.

The Open Verification Methodology, based on the IEEE Std. 1800-2005 SystemVerilog standard, is the industry’s first open, language-interoperable SystemVerilog verification methodology. It provides a methodology and accompanying library that allow users to create modular, reusable verification environments in which components communicate with each other via standard transaction-level modeling interfaces. It also enables intra- and inter-company reuse through a common methodology and classes for virtual sequences and block-to-system reuse, and full integration with other languages commonly used in production flows.

Cadence Design Systems
www.cadence.com

Mentor Graphics
www.mentor.com

OVM World User Community
www.ovmworld.org

About the Author

David Maliniak | MWRF Executive Editor

In his long career in the B2B electronics-industry media, David Maliniak has held editorial roles as both generalist and specialist. As Components Editor and, later, as Editor in Chief of EE Product News, David gained breadth of experience in covering the industry at large. In serving as EDA/Test and Measurement Technology Editor at Electronic Design, he developed deep insight into those complex areas of technology. Most recently, David worked in technical marketing communications at Teledyne LeCroy. David earned a B.A. in journalism at New York University.

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