Anritsu introduces 2- and 4-port VNAs

June 11, 2015

Anritsu has expanded its ShockLine family of vector network analyzers (VNAs) with the introduction of the Performance ShockLine MS46500B Series, which includes models operating up to 8.5 GHz.

The MS46500B Series comprises the 2-port MS46522B and 4-port MS46524B models. Each instrument features an independent source per VNA port, and all the sources can sweep at the same time for measurement of forward and reverse S-parameters simultaneously. With shorter test times, the MS46500B series significantly improves throughput in manufacturing environments.

With its dynamic range, low trace noise, and fast sweep speed, the MS46500B series addresses the S-parameter and time-domain measurement requirements of a complete range of passive device applications. Faster frequency and time domain measurements can be achieved with a time domain with time gating option. In this configuration, the 4-port MS46524B VNA can conduct single-ended, mixed-mode, and time domain reflectometry (TDR) measurements on multiport and differential devices.

The MS46500B series is housed in a 3U high chassis to fit in conventional rack systems, and the VNAs’ short depth allows more bench space for cabling and the DUT. The MS46500B VNAs use industry standard LAN communications for robust remote control in production test environments.

ShockLine software also provides a graphical user interface (GUI) for manual test and engineering use. When attached to a user-supplied touchscreen monitor, the GUI provides comprehensive capabilities, including network extraction, embedding/de-embedding networks, and time domain with time gating. Developing and troubleshooting test programs are made easier, due to advanced marker and limit lines features.

In addition to the MS46500B series, the ShockLine family consists of the MS46121A 1-port USB VNAs, MS46122A 2-port USB VNAs, and MS46322A Economy ShockLine VNAs. ShockLine VNAs eliminate the need to buy expensive instruments for simple S-parameter measurements, and employ multiple architectures that reduce manufacturing costs, enhance calibration stability and minimize measurement uncertainty.

www.anritsu.com

About the Author

Rick Nelson | Contributing Editor

Rick is currently Contributing Technical Editor. He was Executive Editor for EE in 2011-2018. Previously he served on several publications, including EDN and Vision Systems Design, and has received awards for signed editorials from the American Society of Business Publication Editors. He began as a design engineer at General Electric and Litton Industries and earned a BSEE degree from Penn State.

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