Lectures to Address Challenges Within the Lithography Industry

June 17, 2013
Lectures and workshops at the SEMICON West Conference aim to discuss and meet the challenges currently facing the lithography industry.

At SEMICON West 2013 in San Francisco, CA from July 8-12, SEMATECH will be addressing R&D challenges and closing key infrastructure technology gaps through a series of lectures and workshops. Experts from the company will discuss the challenges affecting the next generation of lithography techniques and new materials and processes available for sub-20 nm manufacturing.

Talks from SEMATECH experts include: “Non-Silicon R&D Challenges and Opportunities,” “EUV Lithography: Status and Outlook,” “Challenges of Nanodefectivity,” and “ITRS Front End of Line Technologies: Lithography.” They will also be host to several public workshops on topics including particle metrology and filtration or the reduction and prevention of nanoparticles in solutions.

SEMATECH hopes to discuss and meet the challenges the industry currently faces in order to sustain growth for the future through collaborative research and synergy from all sectors.

About the Author

Iliza Sokol | Associate Content Producer

Iliza joined the Penton Media group in 2013 after graduating from the Fashion Institute of Technology with a BS in Advertising and Marketing Communications. Prior to joining the staff, she worked at NYLON Magazine and a ghostwriting firm based in New York.

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