At SEMICON West 2013 in San Francisco, CA from July 8-12, SEMATECH will be addressing R&D challenges and closing key infrastructure technology gaps through a series of lectures and workshops. Experts from the company will discuss the challenges affecting the next generation of lithography techniques and new materials and processes available for sub-20 nm manufacturing.
Talks from SEMATECH experts include: “Non-Silicon R&D Challenges and Opportunities,” “EUV Lithography: Status and Outlook,” “Challenges of Nanodefectivity,” and “ITRS Front End of Line Technologies: Lithography.” They will also be host to several public workshops on topics including particle metrology and filtration or the reduction and prevention of nanoparticles in solutions.
SEMATECH hopes to discuss and meet the challenges the industry currently faces in order to sustain growth for the future through collaborative research and synergy from all sectors.
