Harvard University’s Center of Nanoscale Systems will use two Surface Technology Systems (STS) plasma processing systems: the inductively coupled plasma (ICP) and Plasma Enhanced Vapor Deposition (PECVD) tools.
Harvard University’s Center of Nanoscale Systems will use two Surface Technology Systems (STS) plasma processing systems: the inductively coupled plasma (ICP) and Plasma Enhanced Vapor Deposition (PECVD) tools.
“These are the first tools we have sold to Harvard, and are pleased to add another key university research facility with multiple tools to our customer base,” Andrew Tucker, general manager and vice president of sales, said in a statement.
The Center for Nanoscale Systems (CNS) focuses on how nanoscale components can be integrated into large and complex interacting systems.
"Our Center is enthusiastic about working together with STS to meet the very demanding needs of leading-edge Nanoscience being conducted at our facility,” Dr. Eric Martin, Technical Director of the CNS at Harvard, said in a statement.