Sensor Measures Plasma Directly

This sensor allows process engineers to monitor and control the plasma process directly, in real time. The Ion Flux Probe (IFT) measures ion flux, and therefore the plasma directly. As a result, users can use statistical process control on plasma parameters themselves instead of on secondary, machine-state, parameters. The IFT provides direct feedback on process anomalies and allows engineers to measure process repeatability in situ. Designed for manufacturing environs, the IFT operates in almost all plasma processes, including PECVD, PVD and etch.