TSMC Announces First 40-nm Process

May 22, 2008
Earlier this spring, Taiwan Semiconductor Manufacturing Company (TSMC) revealed its 40-nm semiconductor process technology. Its portfolio includes embedded DRAM, mixed-signal, RF, and multi-project wafer (MPW) prototyping. The process improves

Earlier this spring, Taiwan Semiconductor Manufacturing Company (TSMC) revealed its 40-nm semiconductor process technology. Its portfolio includes embedded DRAM, mixed-signal, RF, and multi-project wafer (MPW) prototyping. The process improves gate density by a factor of 2.35 over 65 nm. It also reduces active power usage up to 15% over 45 nm and provides the smallest SRAM cell size and macro size in the industry, according to the company. The process is available in both general-purpose and low-power versions. Companies that choose TSMC as a manufacturing partner receive full design services plus a design ecosystem that provides verified thirdparty IP, third-party EDA tools, and TSMC-generated Spice models and IP. TSMC expects the first wafers to show up in the second quarter.

DANIEL HARRIS
TSMC
www.tsmc.com

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