CEPREI adopts low-frequency noise measurement system

Jan. 26, 2016

Keysight Technologies announced that CEPREI (China Electronic Product Reliability and Environmental Testing Research Institute) has successfully adopted the Keysight EEsof EDA E4727A advanced low-frequency noise analyzer (A-LFNA) for measurement and analysis of flicker noise (1/f noise) and random telegraph noise (RTN) during its reliability studies of semiconductor devices including MOSFETs, HEMTs, and TFTs.

Keysight EDA’s E4727A is a high-performance noise analyzer designed to make fast, accurate and repeatable low-frequency noise (LFN) measurements. Offering support for wafer mapping measurement and data analysis of 1/f noise and RTN, as well as repeatable and reliable measurement results, the analyzer is suited for the development, qualification, and monitoring of semiconductor materials and IC manufacturing processes.

CEPREI is the first scientific research organization to engage in product quality and reliability research in China. As the affiliated institute directly under the Ministry of Industry and Information Technology (MIIT), CEPREI provides technical support and services not only for industrial management of MIIT and local government, but also for over 10,000 electronic information companies every year.

“The E4727A solution from Keysight was chosen after careful technical evaluation,” said Dr. Liu Yuan, senior engineer at CEPREI. “Its superior performance ensures accurate measurement results with low system noise, while having the industry’s widest frequency and bias measurement range allows us to study various devices and applications. We look forward to further cooperation with Keysight on a calibration method and its standardization.”

“We are pleased that CEPREI has become yet another reference site for our low-frequency noise measurement system,” said Dr. MA Long, device modeling product manager at Keysight EEsof EDA. “Low-frequency noise is a sensitive and important indicator of semiconductor material and manufacturing processes, and is widely used in reliability, new materials, and novel device research. Keysight is committed to boosting the relevant activities by strengthening our collaboration with top research institutes such as CEPREI, and other universities throughout the world.”

www.keysight.com/find/eesof-a-lfna

About the Author

Rick Nelson | Contributing Editor

Rick is currently Contributing Technical Editor. He was Executive Editor for EE in 2011-2018. Previously he served on several publications, including EDN and Vision Systems Design, and has received awards for signed editorials from the American Society of Business Publication Editors. He began as a design engineer at General Electric and Litton Industries and earned a BSEE degree from Penn State.

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