EOS/ESD Association issues IEW call for presentations
Rome, NY. EOS/ESD Association Inc. is now soliciting presentation abstracts for the 11th annual International Electrostatic Discharge Workshop (IEW). The workshop will be held May 7-11, 2017, in Lake Tahoe, CA.
The 11th annual workshop has added three special attention focus issues for IEW 2017: “The Intersection of ESD Challenges for Emerging/Advancing Technologies and Markets,” “IC Designer’s perspective on ESD [for] IC Circuit and Layout Design Engineers,” and “Everything EOS [for] Product, FA, Reliability, and Verification Test Engineers.”
In addition, submissions are encouraged in the following areas: anomalous/unresolved ESD issues, EDA EOS/ESD tools best practices and experiences; system-level ESD/EOS issues; failure-analysis techniques; technology-integration issues; novel on-chip protection clamps and circuit configurations; and ESD test characterization, methods, and issues.
In keeping with the informal character of this workshop, the abstract should be in the form of a short PowerPoint presentation, containing a summary slide and five additional slides—including representative data and figures that will be the foundation for the full “poster” presentation to be presented/discussed at the workshop. Abstracts must be emailed in pdf format to [email protected], no later than Friday, November 11, 2016, and must include the title, author’s name, and author’s affiliation. The technical program committee will announce the selections to authors on or before December 9, 2016.