Passive Plus Inc. offers Modelithics component library
Huntington, NY, and Tampa, FL. Passive Plus Inc. (PPI), a Modelithics Vendor Partner (MVP), announced it is now offering design engineers a free 90-day trial license for the Modelithics PPI Component Library. This offer provides PPI customers with access to accurate, scalable simulation models for Passive Plus capacitors with advanced features that enable a precise and rapid design process.
The MVP program promoted collaboration and open communication between Passive Plus and Modelithics during the development of advanced data sets and the Modelithics Microwave Global Models for Passive Plus capacitors.
The Microwave Global Models include every part value in a series and permit users to input substrate thickness, dielectric constant, and loss tangent, as well as mounting-pad layout dimensions. Selected models also include capacitor orientation—vertical or horizontal—as an input. Engineers can request free use of the models, by either visiting the Passive Plus Resources page (http://passiveplus.com/addldocs_resources.php) or the Passive Plus MVP page on the Modelithics website (http://www.modelithics.com/mvp/PassivePlus/).
Passive Plus Inc. manufactures high-power passive components using state-of-the-art manufacturing techniques. Specializing in high-Q/low-ESR capacitor product lines, PPI supplies components to the military, medical, semiconductor, broadcast, and telecommunications industries.
Modelithics was formed in 2001 to address the industry-wide need for high-accuracy RF and microwave active and passive simulation models for use in EDA. Modelithics’ premium product is the Modelithics COMPLETE Library, which includes the CLR Library, containing measurement-based Microwave Global Models for commercially-available passive component families; the NLD Library (nonlinear diode models); the NLT Library (nonlinear transistor models); and the SLC Library (system level component models). Modelithics’ services also address a range of custom RF and microwave measurement and modeling needs.